Comparison of diamond-like carbon film deposition by electron cyclotron resonance with benzene and methane

被引:32
作者
Andry, PS
Pastel, PW
Varhue, WJ
机构
[1] Department of Electrical Engineering, University of Vermont, Burlington
基金
美国国家科学基金会;
关键词
D O I
10.1557/JMR.1996.0027
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A comparative study of the deposition of diamond-like carbon films using methane or benzene in a microwave electron cyclotron resonance plasma-enhanced chemical vapor deposition system has been performed. Process variables studied were reactor pressure, applied radio frequency substrate bias, and microwave power. The plasma stream was characterized using optical emission spectroscopy and mass spectrometry. Film properties studied included optical energy gap, total hydrogen content, integrated C-H stretch absorption, index of refraction, and Raman spectra. The use of a high C/H ratio reactant such as benzene was found to be advantageous over methane in that higher deposition rates were possible and the resultant films exhibit diamond-like properties without the application of large substrate biases. Another result of this investigation was further confirmation that hard carbon films contain a significant quantity of nonbonded hydrogen [A. Grill and V. Patel, Appl. Phys. Lett. 60 (17), 2089 (1992)].
引用
收藏
页码:221 / 228
页数:8
相关论文
共 36 条
[21]   SUBPLANTATION MODEL FOR FILM GROWTH FROM HYPERTHERMAL SPECIES - APPLICATION TO DIAMOND [J].
LIFSHITZ, Y ;
KASI, SR ;
RABALAIS, JW .
PHYSICAL REVIEW LETTERS, 1989, 62 (11) :1290-1293
[22]   LOW-TEMPERATURE CHEMICAL VAPOR-DEPOSITION METHOD UTILIZING AN ELECTRON-CYCLOTRON RESONANCE PLASMA [J].
MATSUO, S ;
KIUCHI, M .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (04) :L210-L212
[23]   DEPOSITION MECHANISM OF HYDROGENATED HARD-CARBON FILMS IN A CH4 RF DISCHARGE PLASMA [J].
MUTSUKURA, N ;
INOUE, S ;
MACHI, Y .
JOURNAL OF APPLIED PHYSICS, 1992, 72 (01) :43-53
[24]   THERMAL-CONDUCTIVITY OF DIAMOND FILMS SYNTHESIZED BY MICROWAVE PLASMA CVD [J].
ONO, A ;
BABA, T ;
FUNAMOTO, H ;
NISHIKAWA, A .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1986, 25 (10) :L808-L810
[25]   THE EFFECT OF RADIO-FREQUENCY SUBSTRATE BIASING IN THE DEPOSITION OF DIAMOND-LIKE CARBON-FILMS IN AN ELECTRON-CYCLOTRON RESONANCE DISCHARGE [J].
PASTEL, PW ;
VARHUE, WJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (03) :1129-1133
[26]   DEPOSITION OF DIAMOND-LIKE FILMS BY ELECTRON-CYCLOTRON RESONANCE MICROWAVE PLASMAS [J].
POOL, FS ;
SHING, YH .
JOURNAL OF APPLIED PHYSICS, 1990, 68 (01) :62-65
[27]   HARD AMORPHOUS (DIAMOND-LIKE) CARBONS [J].
ROBERTSON, J .
PROGRESS IN SOLID STATE CHEMISTRY, 1991, 21 (04) :199-333
[28]   ELECTRONIC AND ATOMIC-STRUCTURE OF AMORPHOUS-CARBON [J].
ROBERTSON, J ;
OREILLY, EP .
PHYSICAL REVIEW B, 1987, 35 (06) :2946-2957
[29]  
ROTH RM, 1987, PLASMA PROCESSING SY, V98, P327
[30]   RAMAN-SCATTERING AND THE PI-ORBITALS IN AMORPHOUS-CARBON FILMS [J].
SINHA, K ;
MENENDEZ, J ;
SANKEY, OF ;
JOHNSON, DA ;
VARHUE, WJ ;
KIDDER, JN ;
PASTEL, PW ;
LANFORD, W .
APPLIED PHYSICS LETTERS, 1992, 60 (05) :562-564