Density determination of focused-electron-beam-induced deposits with simple cantilever-based method

被引：36

作者：

Utke, I

Friedli, V

Michler, J

Bret, T

Multone, X

Hoffmann, P

机构：

[1] EMPA Mat Sci & Technol, Nanomech & Nanopatterning Grp, CH-3602 Thun, Switzerland

[2] Ecole Polytech Fed Lausanne, Adv Photon Lab, CH-1015 Lausanne, Switzerland

来源：

APPLIED PHYSICS LETTERS | 2006年 / 88卷 / 03期

关键词：

D O I：

10.1063/1.2158516

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Freestanding deposits are grown on a silicon cantilever from a precursor gas by an electron induced process. Deposit mass determination is performed with an atomic force microscopy setup, where the cantilever resonance frequency shift, resulting from mechanical removal of the deposit, is measured. Deposits from hexafluoroacetylacetonato-Cu(I)-vinyltrimethylsilane show densities ranging from 2.05 +/- 0.45 to 3.75 +/- 0.55 g/cm(3). Deposits from tetramethoxysilane have a constant density of (1.9 +/- 0.3) g/cm(3). Densities of deposits from Co-2(CO)(8) and [RhCl(PF3)(2)](2) are linearly related to their composition. The ratio of impinging electrons per deposited atom, beam heating, and thermal stability of the precursor molecule determine the density and composition in focused-electron-beam-induced deposits. (c) 2006 American Institute of Physics.

引用

收藏

页码：1 / 3

页数：3

相关论文

共 17 条

[1] Characterization of focused electron beam induced carbon deposits from organic precursors [J].

Bret, T ;

Mauron, S ;

Utke, I ;

Hoffmann, P .

MICROELECTRONIC ENGINEERING, 2005, 78-79 :300-306

[2] Thermal conductivity of amorphous carbon thin films [J].

Bullen, AJ ;

O'Hara, KE ;

Cahill, DG ;

Monteiro, O ;

von Keudell, A .

JOURNAL OF APPLIED PHYSICS, 2000, 88 (11) :6317-6320

[3] Effect of the neutral ligand (L) on the characteristics of hexafluoroacetylacetonate (hfac)Cu(I)-L precursor and on the copper deposition process [J].

Choi, KK ;

Rhee, SW .

THIN SOLID FILMS, 2002, 409 (01) :147-152

[4] FORMATION OF THIN POLYMER FILMS BY ELECTRON BOMBARDMENT [J].

CHRISTY, RW .

JOURNAL OF APPLIED PHYSICS, 1960, 31 (09) :1680-1683

[5] THERMAL-DECOMPOSITION OF TETRAMETHYL ORTHOSILICATE IN THE GAS-PHASE - AN EXPERIMENTAL AND THEORETICAL-STUDY OF THE INITIATION PROCESS [J].

CHU, JCS ;

SOLLER, R ;

LIN, MC ;

MELIUS, CF .

JOURNAL OF PHYSICAL CHEMISTRY, 1995, 99 (02) :663-672

[6] MINERAL PRECURSOR FOR CHEMICAL VAPOR-DEPOSITION OF RH METALLIC-FILMS [J].

DOPPELT, P ;

WEIGEL, V ;

GUINOT, P .

MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1993, 17 (1-3) :143-146

[7] INSITU MEASUREMENT OF ION-BEAM-INDUCED DEPOSITION OF GOLD [J].

DUBNER, AD ;

WAGNER, A .

JOURNAL OF APPLIED PHYSICS, 1989, 65 (09) :3636-3643

[8] Growth of three-dimensional nano-structures using FIB-CVD and its mechanical properties [J].

Fujita, J ;

Ishida, M ;

Ichihashi, T ;

Ochiai, Y ;

Kaito, T ;

Matsui, S .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2003, 206 :472-477

[9] Focused ion beam-induced fabrication of tungsten structures [J].

Ishida, M ;

Fujita, J ;

Ichihashi, T ;

Ochiai, Y ;

Kaito, T ;

Matsui, S .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (06) :2728-2731

[10] Density estimation for amorphous carbon nanopillars grown by focused ion beam assisted chemical vapor deposition [J].

Ishida, M ;

Fujita, J ;

Ochiai, Y .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (06) :2784-2787