Very low bias stress in n-type organic single-crystal transistors

被引:35
作者
Barra, M. [1 ,2 ]
Di Girolamo, F. V. [1 ,2 ]
Minder, N. A. [3 ,4 ]
Lezama, I. Gutierrez [3 ,4 ]
Chen, Z. [5 ]
Facchetti, A. [5 ,6 ,7 ]
Morpurgo, A. F. [3 ,4 ]
Cassinese, A. [1 ,2 ]
机构
[1] Univ Naples Federico II, CNR SPIN, I-80125 Naples, Italy
[2] Univ Naples Federico II, Dept Phys Sci, I-80125 Naples, Italy
[3] Univ Geneva, DPMC, CH-1211 Geneva, Switzerland
[4] Univ Geneva, GAP, CH-1211 Geneva, Switzerland
[5] Polyera Corp, Skokie, IL 60077 USA
[6] Northwestern Univ, Dept Chem, Evanston, IL 60208 USA
[7] Northwestern Univ, Mat Res Ctr, Evanston, IL 60208 USA
关键词
HIGH-ELECTRON-MOBILITY; FIELD-EFFECT TRANSISTORS; THIN-FILM TRANSISTORS; TRANSPORT; SEMICONDUCTORS; AIR; INSTABILITY; STABILITY; AMBIENT; SHIFTS;
D O I
10.1063/1.3698341
中图分类号
O59 [应用物理学];
学科分类号
摘要
Bias stress effects in n-channel organic field-effect transistors (OFETs) are investigated using N,N'-bis(n-alkyl)-(1,7 and 1,6)-dicyanoperylene-3,4:9,10-bis(dicarboximide)s (PDIF-CN2) single-crystal devices with Cytop gate dielectric, both under vacuum and in ambient. We find that the amount of bias stress is very small as compared to all (p-channel) OFETs reported in the literature. Stressing the PDIF-CN2 devices by applying 80V to the gate for up to a week results in a decrease of the source drain current of only similar to 1% under vacuum and similar to 10% in air. This remarkable stability of the devices leads to characteristic time constants tau, extracted by fitting the data with a stretched exponential-that are tau similar to 2 x 10(9) s in air and tau similar to 5 x 10(9) s in vacuum-approximately two orders of magnitude larger than the best values reported previously for p-channel OFETs. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.3698341]
引用
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页数:4
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