Microscopic contact charging and dissipation

被引:15
作者
Morita, S [1 ]
Sugawara, Y [1 ]
机构
[1] Osaka Univ, Grad Sch Engn, Dept Elect Engn, Suita, Osaka 5650871, Japan
关键词
atomic force microscopy (AFM); charging; contacts; silicon oxide; deposition process; surface diffusion;
D O I
10.1016/S0040-6090(01)01102-6
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We investigated elementary processes of microscopic contact charging and charge dissipation on and in thin silicon oxide, using a reproducible and controllable contact charging method. As a result, we found that negative charges have three stages of contact charging and charge dissipation, while positive charges have only one stage. By continuing with the contact charging, negative charges became high density, i.e. a solid phase of charges, on the silicon oxide surface at room temperature in air. Furthermore, we succeeded in imaging point charges on n(+)-GaAs(110) cleaved surfaces with atomic resolution using a modified non-contact atomic force microscope. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:310 / 318
页数:9
相关论文
共 28 条
[21]   SPATIAL DISTRIBUTIONS OF DENSELY CONTACT-ELECTRIFIED CHARGES ON A THIN SILICON-OXIDE [J].
SUGAWARA, Y ;
MORITA, S ;
FUKANO, Y ;
UCHIHASHI, T ;
OKUSAKO, T ;
CHAYAHARA, A ;
YAMANISHI, Y ;
OASA, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1994, 33 (1A) :L74-L77
[22]   CONTACT ELECTRIFICATION USING FORCE MICROSCOPY [J].
TERRIS, BD ;
STERN, JE ;
RUGAR, D ;
MAMIN, HJ .
PHYSICAL REVIEW LETTERS, 1989, 63 (24) :2669-2672
[23]   Proximity effects of negative charge groups contact-electrified on thin silicon oxide in air [J].
Uchihashi, T ;
Okusako, T ;
Sugawara, Y ;
Yamanishi, Y ;
Oasa, T ;
Morita, S .
JOURNAL OF APPLIED PHYSICS, 1996, 79 (08) :4174-4177
[24]   Correlation between contact-electrified charge groups on a thin silicon oxide [J].
Uchihashi, T ;
Okusako, T ;
Sugawara, Y ;
Yamanishi, Y ;
Oasa, T ;
Morita, S .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (02) :1055-1059
[25]   Charge dissipation on chemically treated thin silicon oxide in air [J].
Uchihashi, T ;
Nakano, A ;
Ida, T ;
Andoh, Y ;
Kaneko, R ;
Sugawara, Y ;
Morita, S .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1997, 36 (6A) :3755-3758
[26]   Development of ultrahigh vacuum atomic force microscopy with frequency modulation detection and its application to electrostatic force measurement [J].
Uchihashi, T ;
Ohta, M ;
Sugawara, Y ;
Yanase, Y ;
Sigematsu, T ;
Suzuki, M ;
Morita, S .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 15 (04) :1543-1546
[27]  
1999, P 1 INT WORKSH NONC, V140
[28]  
2000, P 2 INT WORKSH NONC, V15