Measurement of Einstein's A coefficient of the 296.7 nm transition line of the carbon atom

被引:8
作者
Ito, H
Ito, M
Hori, M
Kono, A
Takeo, T
Kato, T
Goto, T
机构
[1] NAGOYA UNIV, DEPT QUANTUM ENGN, CHIKUSA KU, NAGOYA, AICHI 464, JAPAN
[2] NAGOYA UNIV, CCRAST, CHIKUSA KU, NAGOYA, AICHI 464, JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1997年 / 36卷 / 12A期
关键词
carbon atom; Einstein's A coefficient; ECR plasma; diamond film; etching;
D O I
10.1143/JJAP.36.L1616
中图分类号
O59 [应用物理学];
学科分类号
摘要
We measured Einstein's A coefficient of the transition line of the C atom at 296.7 nm (2s2p(3) S-5(2) - 2s(2)2p(2) P-3(2)), which is useful for the absorption spectroscopic measurement of C atom density in processing plasmas. Einstein's A coefficient was evaluated from the emission decay rate of the 296.7 nm line in an electron cyclotron plasma employing CO gas. The obtained value of 3.9x10(4) s(-1) is almost 2000 times as large as the reported theoretical A coefficient [G. H. Garstang: The Observatory 82 (1962) 50].
引用
收藏
页码:L1616 / L1618
页数:3
相关论文
共 12 条
[1]   A MATHEMATICAL-MODEL OF SILICON CHEMICAL VAPOR-DEPOSITION - FURTHER REFINEMENTS AND THE EFFECTS OF THERMAL-DIFFUSION [J].
COLTRIN, ME ;
KEE, RJ ;
MILLER, JA .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (06) :1206-1213
[2]   Diagnostics of fluorocarbon radicals in a large-area permanent magnet electron cyclotron resonance etching plasma [J].
Den, S ;
Kuno, T ;
Ito, M ;
Hori, M ;
Goto, T ;
Hayashi, Y ;
Sakamoto, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1996, 35 (12B) :6528-6533
[3]  
GRASTANG GH, 1962, OBSERVATORY, V82, P50
[4]  
Hirshfelder J. O., 1954, MOL THEORY GASES LIQ
[5]   CH3 RADICAL DENSITY IN ELECTRON-CYCLOTRON-RESONANCE CH3OH AND CH3OH/H-2 PLASMAS [J].
IKEDA, M ;
AISO, K ;
HORI, M ;
GOTO, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1995, 34 (6A) :3273-3277
[6]   Measurement of carbon atom density in high density plasma process [J].
Ito, H ;
Ikeda, M ;
Ito, M ;
Hori, M ;
Takeo, T ;
Hattori, H ;
Goto, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1997, 36 (7A) :L880-L882
[7]   CFX (X=1-3) RADICAL MEASUREMENTS IN ECR ETCHING PLASMA EMPLOYING C4F6 GAS BY INFRARED DIODE-LASER ABSORPTION-SPECTROSCOPY [J].
MIYATA, K ;
TAKAHASHI, K ;
KISHIMOTO, S ;
HORI, M ;
GOTO, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1995, 34 (4A) :L444-L447
[8]  
NUSSBAUMER H, 1984, ASTRON ASTROPHYS, V140, P383
[9]   CHARACTERISTICS OF FLUOROCARBON RADICALS AND CHF3 MOLECULE IN CHF3 ELECTRON-CYCLOTRON-RESONANCE DOWNSTREAM PLASMA [J].
TAKAHASHI, K ;
HORI, M ;
GOTO, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (08) :4745-4751
[10]  
WIESE WL, 1966, ATOMIC TRANSITION PR, V2, P193