Features of self-supporting tungsten nanowire deposited with high-energy electrons

被引:31
作者
Liu, ZQ [1 ]
Mitsuishi, K [1 ]
Furuya, K [1 ]
机构
[1] Natl Inst Mat Sci, Nanomat Lab, Tsukuba, Ibaraki 3050003, Japan
关键词
D O I
10.1063/1.1755434
中图分类号
O59 [应用物理学];
学科分类号
摘要
The features of self-supporting tungsten nanowire fabricated by electron-beam-induced deposition using 200 keV electrons were investigated. The width of wire first decreases with the increase of the scan speed, then saturates at about 7-10 nm when the scan speed is higher than 10 nm/s. The wire has belt-shipped morphology elongated along the incident beam. The wire parallel to the substrate surface was fabricated at the beam scan speed of 4.0 nm/s, while those with upward and downward features were obtained by changing the scan speed. Nanobelt, nanorod, and nanotip with high aspect ration and small lateral size were fabricated with this method. Considering the forward scattering of electrons and the beam Gaussian profile, a model was developed for the growth of wire using high-energy electrons. (C) 2004 American Institute of Physics.
引用
收藏
页码:619 / 623
页数:5
相关论文
共 21 条
[1]   NEW SCANNING TUNNELING MICROSCOPY TIP FOR MEASURING SURFACE-TOPOGRAPHY [J].
AKAMA, Y ;
NISHIMURA, E ;
SAKAI, A ;
MURAKAMI, H .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (01) :429-433
[2]   MONTE-CARLO CALCULATION OF LOW-ENERGY ELECTRON-EMISSION FROM SURFACES [J].
ALLEN, TE ;
KUNZ, RR ;
MAYER, TM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06) :2057-2060
[3]   A NEW APPROACH TO FABRICATION OF NANOSTRUCTURES [J].
ARISTOV, VV ;
KASUMOV, AY ;
KISLOV, NA ;
KONONENKO, OV ;
MATVEEV, VN ;
TULIN, VA ;
KHODOS, II ;
GORBATOV, YA ;
NIKOLAICHIK, VI .
NANOTECHNOLOGY, 1995, 6 (02) :35-39
[4]   THE ORIGIN OF SPECIMEN CONTAMINATION IN THE ELECTRON MICROSCOPE [J].
ENNOS, AE .
BRITISH JOURNAL OF APPLIED PHYSICS, 1953, 4 (APR) :101-106
[5]   INSITU OBSERVATION ON ELECTRON-BEAM INDUCED CHEMICAL VAPOR-DEPOSITION BY TRANSMISSION ELECTRON-MICROSCOPY [J].
ICHIHASHI, T ;
MATSUI, S .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06) :1869-1872
[6]   RESOLUTION LIMITS IN ELECTRON-BEAM-INDUCED TUNGSTEN DEPOSITION [J].
KOHLMANNVONPLATEN, KT ;
CHLEBEK, J ;
WEISS, M ;
REIMER, K ;
OERTEL, H ;
BRUNGER, WH .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06) :2219-2223
[7]   HIGH-RESOLUTION ELECTRON-BEAM INDUCED DEPOSITION [J].
KOOPS, HWP ;
WEIEL, R ;
KERN, DP ;
BAUM, TH .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (01) :477-481
[8]   CHARACTERIZATION AND APPLICATION OF MATERIALS GROWN BY ELECTRON-BEAM-INDUCED DEPOSITION [J].
KOOPS, HWP ;
KRETZ, J ;
RUDOLPH, M ;
WEBER, M ;
DAHM, G ;
LEE, KL .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (12B) :7099-7107
[9]   SELECTIVE AREA DEPOSITION OF METALS USING LOW-ENERGY ELECTRON-BEAMS [J].
KUNZ, RR ;
ALLEN, TE ;
MAYER, TM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (05) :1427-1431
[10]   Properties and applications of cobalt-based Material produced by electron-beam-induced deposition [J].
Lau, YM ;
Chee, PC ;
Thong, JTL ;
Ng, V .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2002, 20 (04) :1295-1302