Indium oxide thin-film holographic recorders grown by excimer laser reactive sputtering

被引：25

作者：

Grivas, C ^{[1
]}

Gill, DS ^{[1
]}

Mailis, S ^{[1
]}

Boutsikaris, L ^{[1
]}

Vainos, NA ^{[1
]}

机构：

[1] Fdn Res & Technol Hellas, Inst Elect Struct & Laser, Laser & Applicat Div, Heraklion 71110, Crete, Greece

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1998年 / 66卷 / 02期

关键词：

D O I：

10.1007/s003390050656

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Growth of indium oxide (In2O3) thin films on glass substrates is performed by pulsed laser ablation of a metallic indium target in an oxygen atmosphere. X-ray diffraction analysis verifies that a transition, from amorphous to polycrystalline film growth, occurs at a temperature of 150 degrees C. Films grown under optimized conditions exhibit optical transmission higher than 80% in the visible light. Ultraviolet radiation (lambda = 325 nm) induced dynamic holographic recording in films deposited at specific temperature and oxygen pressure settings is also demonstrated.

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收藏

页码：201 / 204

页数：4

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