Preliminary studies on molybdenum-doped indium oxide thin films deposited by radio-frequency magnetron sputtering at room temperature

被引:13
作者
Elangovan, E. [1 ]
Marques, A.
Fernandes, F. M. Braz
Martins, R.
Fortunato, E.
机构
[1] Univ Nova Lisboa, Fac Sci & Technol, CENIMAT, Dept Mat Sci, P-2829516 Caparica, Portugal
[2] Univ Nova Lisboa, CEMOP, P-2829516 Caparica, Portugal
关键词
indium-molybdenum oxide thin films; x-ray diffraction; optical properties; radio-frequency sputtering;
D O I
10.1016/j.tsf.2007.01.022
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Thin films of molybdenum-doped indium oxide (IMO) were prepared by a 3-source, cylindrical radio-frequency magnetron sputtering at room temperature. The films were post-annealed and were characterized by their structural (X-ray diffraction) and optical (UV-VIS-NIR spectrophotometer) properties. The films were studied as a function of oxygen volume percentage (O-2 vol.%) ranging from 3.5 to 17.5. The structural studies revealed that the as-deposited amorphous films become crystalline on annealing. In most cases, the (222) reflection emerged as high intensive peak. The poor visible transmittance of the films as-deposited without oxygen was increased from similar to 12% to over 80% on introducing oxygen (3.5 02 vol.%). For the films annealed in open air, the average visible transmittance in the wavelength ranging 400-800 nm was varied between 77 and 84%. The films annealed at high temperatures (> 300 degrees C) decreased the transmittance to as low as < 1%. The optical band gap of the as-deposited films increased from the range 3.83-3.90 to 3.85-3.98 eV on annealing at different conditions. (C) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:5512 / 5518
页数:7
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