Influence of pattern density in nanoimprint lithography

被引：53

作者：

Gourgon, C

Perret, C

Micouin, G

Lazzarino, F

Tortai, JH

Joubert, O

Grolier, JPE

机构：

[1] CEA, CNRS, LETI, Lab Technol Microelect, F-38054 Grenoble, France

[2] Univ Clermont Ferrand, Lab Thermodynam Solut & Polymeres, F-63177 Aubiere, France

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2003年 / 21卷 / 01期

关键词：

D O I：

10.1116/1.1532735

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Polymer selection and critical dimension control across the wafer are key parameters for the nanoimprint lithography technique. This nanotechnoiogy requires polymers having a low glass., transition temperature T-g combined with a good etch resistance. In this work, three different polymers have been evaluated. The influence of the temperature and pressing time is analyzed to clarify the correlation between polymer behavior and printing uniformity as a function of the pattern density. Measurements of the polymer residual thickness show that the printing uniformity is strongly correlated with the thermal properties of the polymer. (C) 2003 American Vacuum Society.

引用

页码：98 / 105

页数：8

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