SI (111) SURFACE CLEANING USING ATOMIC-HYDROGEN AND SIH2 STUDIED USING REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION

被引：29

作者：

HIRAYAMA, H

TATSUMI, T

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 02期

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D O I：

10.1063/1.343529

中图分类号：

O59 [应用物理学];

学科分类号：

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页码：629 / 633

页数：5

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