INFLUENCE OF NUCLEATION ON THE KINETICS OF BORON PRECIPITATION IN SILICON

被引：38

作者：

LANDI, E

GUIMARAES, S

SOLMI, S

机构：

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1987年 / 44卷 / 02期

关键词：

D O I：

10.1007/BF00626414

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：135 / 141

页数：7

共 30 条

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