GAS-PHASE REACTIONS IN PLASMAS OF SF6 WITH O2 - REACTIONS OF F WITH SOF2 AND SO2 AND REACTIONS OF O WITH SOF2

被引：22

作者：

PLUMB, IC

RYAN, KR

机构：

来源：

PLASMA CHEMISTRY AND PLASMA PROCESSING | 1989年 / 9卷 / 03期

关键词：

D O I：

10.1007/BF01083675

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

页码：409 / 420

页数：12

共 14 条

[1] PLASMA-ETCHING OF SI AND SIO2 IN SF6-O2 MIXTURES [J].

DAGOSTINO, R ;

FLAMM, DL .

JOURNAL OF APPLIED PHYSICS, 1981, 52 (01) :162-167

[2] KINETIC-STUDIES OF THE REACTION OF C2H5 WITH O-2 AT 295-K [J].

PLUMB, IC ;

RYAN, KR .

INTERNATIONAL JOURNAL OF CHEMICAL KINETICS, 1981, 13 (10) :1011-1028

[3] GAS-PHASE REACTIONS OF SF-5, SF-2, AND SOF WITH O(P-3) - THEIR SIGNIFICANCE IN PLASMA PROCESSING [J].

PLUMB, IC ;

RYAN, KR .

PLASMA CHEMISTRY AND PLASMA PROCESSING, 1986, 6 (03) :247-258

[4] GAS-PHASE REACTIONS OF CF3 AND CF2 WITH ATOMIC AND MOLECULAR FLUORINE - THEIR SIGNIFICANCE IN PLASMA-ETCHING [J].

PLUMB, IC ;

RYAN, KR .

PLASMA CHEMISTRY AND PLASMA PROCESSING, 1986, 6 (01) :11-25

[5]

Ryan K. R., 1984, Plasma Chemistry and Plasma Processing, V4, P271, DOI 10.1007/BF00568981

[6] GAS-PHASE COMBINATION REACTIONS OF SF4 AND SF5 WITH F IN PLASMAS OF SF6 [J].

RYAN, KR ;

PLUMB, IC .

PLASMA CHEMISTRY AND PLASMA PROCESSING, 1988, 8 (03) :281-291

[7] GAS-PHASE REACTIONS IN PLASMAS OF SF6 WITH O-2 IN HE [J].

RYAN, KR ;

PLUMB, IC .

PLASMA CHEMISTRY AND PLASMA PROCESSING, 1988, 8 (03) :263-280

[8] NEUTRAL DECOMPOSITION PRODUCTS IN SPARK BREAKDOWN OF SF6 [J].

SAUERS, I ;

ELLIS, HW ;

CHRISTOPHOROU, LG .

IEEE TRANSACTIONS ON ELECTRICAL INSULATION, 1986, 21 (02) :111-120

[9]

Siddagangappa M. C., 1986, Conference Record of the 1986 IEEE International Symposium on Electrical Insulation (Cat. No.86CH2196-4-DEI), P225

[10]

SIDDAGANGAPPA MC, 1985, 8 INT C GAS DISCH TH, P247

← 1 2 →