THE INTERACTION OF SB4 MOLECULAR-BEAMS WITH SI(100) SURFACES - MODULATED-BEAM MASS-SPECTROMETRY AND THERMALLY STIMULATED DESORPTION STUDIES

被引：113

作者：

BARNETT, SA

WINTERS, HF

GREENE, JE

机构：

[1] UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801

[2] IBM CORP,RES LAB,SAN JOSE,CA 95193

来源：

SURFACE SCIENCE | 1986年 / 165卷 / 2-3期

关键词：

D O I：

10.1016/0039-6028(86)90809-5

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：303 / 326

页数：24

共 18 条

[11] NORMAL-TYPE DOPING TECHNIQUES IN SILICON MOLECULAR-BEAM EPITAXY BY SIMULTANEOUS ARSENIC ION-IMPLANTATION AND BY ANTIMONY EVAPORATION [J].

OTA, Y .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (10) :1761-1765

[12] SILICON MOLECULAR-BEAM EPITAXY WITH SIMULTANEOUS ION IMPLANT DOPING [J].

OTA, Y .

JOURNAL OF APPLIED PHYSICS, 1980, 51 (02) :1102-1110

[13] Si Molecular Beam Epitaxy (n on n(+)) with Wide Range Doping Control [J].

Ota, Yusuke .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (11) :1795-1802

[14] COMPARISON OF DIFFUSION-THEORY ADSORPTION AND DESORPTION RATE CONSTANTS WITH EXPERIMENTAL LIFETIMES [J].

PAGNI, PJ .

JOURNAL OF CHEMICAL PHYSICS, 1973, 58 (07) :2940-2954

[15] KINETICS OF ANTIMONY DOPING IN SILICON MOLECULAR-BEAM EPITAXY [J].

TABE, M ;

KAJIYAMA, K .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1983, 22 (03) :423-428

[16]

TOMPKINS FC, 1978, CHEMISORPTION GASES, P34

[17] RF INDUCTION TECHNIQUE FOR SAMPLE HEATING IN SURFACE SCIENCE EXPERIMENTS [J].

WINTERS, HF ;

SCHLAEGEL, J ;

HORNE, D .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (04) :1605-1608

[18] ETCH PRODUCTS FROM THE REACTION ON CL-2 WITH AL(100) AND CU(100) AND XEF2 WITH W(111) AND NB [J].

WINTERS, HF .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01) :9-15

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