PMIPK-AZIDE DRY-DEVELOPABLE RESIST IN ELECTRON-BEAM LITHOGRAPHY

被引：5

作者：

TSUDA, M

OIKAWA, S

YABUTA, M

YAKOTA, A

NAKANE, H

YAMASHITA, K

GAMO, K

NAMBA, S

机构：

[1] TOKYO OHKA KOG-YO CO LTD,SAMUKAWA 25301,JAPAN

[2] OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1985年 / 3卷 / 02期

关键词：

D O I：

10.1116/1.583303

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：481 / 484

页数：4

共 12 条

[1] NANOMETER PATTERN DELINEATION BY ELECTRON AND ION-BEAM LITHOGRAPHY
GAMO, K
YAMASHITA, K
NAMBA, S
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1984, 23 (03): : L141 - L143
[2] PLASMA-DEVELOPED X-RAY RESISTS
TAYLOR, GN
WOLF, TM
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (12) : 2665 - 2674
[3] ORGANO-SILICON MONOMERS FOR PLASMA-DEVELOPED X-RAY RESISTS
TAYLOR, GN
WOLF, TM
MORAN, JM
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 872 - 880
[4] A NEGATIVE-WORKING PLASMA-DEVELOPED PHOTORESIST
TAYLOR, GN
WOLF, TM
GOLDRICK, MR
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (02) : 361 - 366
[5] TAYLOR GN, 1983, POLYM ENG SCI, V23, P986
[6] A PRINCIPLE FOR THE FORMULATION OF PLASMA DEVELOPABLE RESISTS AND THE IMPORTANCE OF DRY DEVELOPMENT OF SUB-MICRON LITHOGRAPHY
TSUDA, M
OIKAWA, S
KANAI, W
YOKOTA, A
HIJIKATA, I
UEHARA, A
NAKANE, H
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (02): : 259 - 261
[7] PLASMA DEVELOPABLE PHOTORESIST CONTAINING ELECTRONIC EXCITATION-ENERGY QUENCHING SYSTEM
TSUDA, M
OIKAWA, S
YOKOTA, A
YABUTA, M
KANAI, W
KASHIWAGI, KI
HIJIKATA, I
NAKANE, H
[J]. POLYMER ENGINEERING AND SCIENCE, 1983, 23 (18) : 993 - 999
[8] A HIGHLY-SENSITIVE DRY DEVELOPABLE RESIST
TSUDA, M
OIKAWA, S
YABUTA, M
YOKOTA, A
NAKANE, H
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1984, 23 (02): : 259 - 264
[9] HIGH-REMAINING DRY-DEVELOPED RESIST PATTERNS OF STEEP PROFILE
TSUDA, M
YOKOTA, A
KASHIWAGI, K
YABUTA, M
OIKAWA, S
KANAI, W
NAKANE, H
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1983, 22 (07): : 1215 - 1220
[10] NOVEL PLASMA DEVELOPABLE RESIST COMPOSITIONS AND PERFORMANCE OF TOTAL DRY MICROFABRICATIONS IN SUB-MICRON LITHOGRAPHY
TSUDA, M
OIKAWA, S
KANAI, W
HASHIMOTO, K
YOKOTA, A
NUINO, K
HIJIKATA, I
UEHARA, A
NAKANE, H
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1351 - 1357

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