INTERACTIONS OF NITRIC-OXIDE WITH SI(111) AND (100) AT HIGH-TEMPERATURES

被引：17

作者：

HE, DR

SMITH, FW

机构：

来源：

SURFACE SCIENCE | 1985年 / 154卷 / 2-3期

关键词：

D O I：

10.1016/0039-6028(85)90038-X

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：347 / 356

页数：10

共 17 条

[11] REACTIONS OF NO WITH THE SI(111) (7X7) SURFACE - EELS, LEED AND AES STUDIES [J].

NISHIJIMA, M ;

KOBAYASHI, H ;

EDAMOTO, K ;

ONCHI, M .

SURFACE SCIENCE, 1984, 137 (2-3) :473-490

[12] NITRIDATION OF SI(111) BY NITROGEN-ATOMS .2. [J].

SCHROTT, AG ;

FAIN, SC .

SURFACE SCIENCE, 1982, 123 (2-3) :204-222

[13] NITRIDATION OF SI(111) BY NITROGEN-ATOMS [J].

SCHROTT, AG ;

FAIN, SC .

SURFACE SCIENCE, 1981, 111 (01) :39-52

[14] REACTION OF OXYGEN WITH SI(111) AND (100) - CRITICAL CONDITIONS FOR THE GROWTH OF SIO2 [J].

SMITH, FW ;

GHIDINI, G .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (06) :1300-1306

[15] REACTIONS OF ACETYLENE AND AMMONIA WITH THE SI(111) SURFACE AT HIGH-TEMPERATURES [J].

SMITH, FW ;

MEYERSON, B .

THIN SOLID FILMS, 1979, 60 (02) :227-230

[16]

STULL DR, 1971, NSRDSNBS37

[17] THERMAL NITRIDATION OF SI(111) BY NITRIC-OXIDE [J].

WIGGINS, MD ;

BAIRD, RJ ;

WYNBLATT, P .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (03) :965-970

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