HYDROGEN-SULFIDE DOPING OF GAAS AND ALXGA1-XAS GROWN BY MOLECULAR-BEAM EPITAXY (MBE)

被引:6
作者
BRIONES, F
GOLMAYO, D
GONZALEZ, L
DEMIGUEL, JL
机构
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1985年 / 36卷 / 03期
关键词
D O I
10.1007/BF00624935
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:147 / 151
页数:5
相关论文
共 22 条
[1]   GROWTH OF HIGH-QUALITY EPITAXIAL GAAS FILMS BY SPUTTER DEPOSITION [J].
BARNETT, SA ;
BAJOR, G ;
GREENE, JE .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (03) :906-907
[2]   COMPREHENSIVE ANALYSIS OF SI-DOPED ALXGA1-XAS (X=0 TO 1) - THEORY AND EXPERIMENTS [J].
CHAND, N ;
HENDERSON, T ;
KLEM, J ;
MASSELINK, WT ;
FISCHER, R ;
CHANG, YC ;
MORKOC, H .
PHYSICAL REVIEW B, 1984, 30 (08) :4481-4492
[3]   GROWTH OF III-V SEMICONDUCTORS BY MOLECULAR-BEAM EPITAXY AND THEIR PROPERTIES [J].
CHO, AY .
THIN SOLID FILMS, 1983, 100 (04) :291-317
[4]   USE OF SNTE AS THE SOURCE OF DONOR IMPURITIES IN GAAS GROWN BY MOLECULAR-BEAM EPITAXY [J].
COLLINS, DM .
APPLIED PHYSICS LETTERS, 1979, 35 (01) :67-70
[5]   THE INFLUENCE OF GROWTH-CONDITIONS ON SULFUR AND SELENIUM INCORPORATION IN GA1-XALXAS GROWN BY MOLECULAR-BEAM EPITAXY [J].
DAVIES, GJ ;
HECKINGBOTTOM, R ;
ANDREWS, DA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1984, 2 (02) :186-187
[6]   ELECTROCHEMICAL SULFUR DOPING OF GAAS GROWN BY MOLECULAR-BEAM EPITAXY [J].
DAVIES, GJ ;
ANDREWS, DA ;
HECKINGBOTTOM, R .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (12) :7214-7218
[7]  
DINGLE R, 1977, 6TH P INT S GAAS REL, V33, P210
[8]   INTERPLAY OF THERMODYNAMICS AND KINETICS IN MOLECULAR-BEAM EPITAXY (MBE) OF DOPED GALLIUM-ARSENIDE [J].
HECKINGBOTTOM, R ;
TODD, CJ ;
DAVIES, GJ .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (02) :444-450
[9]   GROWTH AND DOPING OF GALLIUM-ARSENIDE USING MOLECULAR-BEAM EPITAXY (MBE) - THERMODYNAMIC AND KINETIC ASPECTS [J].
HECKINGBOTTOM, R ;
DAVIES, GJ ;
PRIOR, KA .
SURFACE SCIENCE, 1983, 132 (1-3) :375-389
[10]   SI AND SN DOPING IN ALXGA1-XAS GROWN BY MBE [J].
ISHIBASHI, T ;
TARUCHA, S ;
OKAMOTO, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1982, 21 (08) :L476-L478