NANOFABRICATION TECHNIQUES FOR A 100 NM-SCALE TUNGSTEN POLYCIDE GATE STRUCTURE

被引：1

作者：

AZUMA, T

NAKASUGI, T

OOGI, S

TAKIGAMI, Y

OYAMATSU, H

机构：

[1] TOSHIBA CO LTD,ULSI RES LAB,SAIWAI KU,KAWASAKI 210,JAPAN

[2] TOSHIBA CO LTD,SEMICOND DEVICE ENGN LAB,SAIWAI KU,KAWASAKI 210,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1993年 / 11卷 / 06期

关键词：

D O I：

10.1116/1.586553

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：2123 / 2126

页数：4

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