CHEMICAL VAPOR-DEPOSITION OF SILICON UNDER REDUCED PRESSURE IN HOT-WALL REACTORS

被引：60

作者：

WILKE, TE

TURNER, KA

TAKOUDIS, CG

机构：

[1] Purdue Univ, West Lafayette, IN, USA, Purdue Univ, West Lafayette, IN, USA

来源：

CHEMICAL ENGINEERING SCIENCE | 1986年 / 41卷 / 04期

关键词：

CHEMICAL VAPOR DEPOSITION - HOT WALL DEPOSITION REACTORS - LOW PRESSURE TUBULAR REACTOR - POLYSILICON - SILANE DECOMPOSITION;

D O I：

10.1016/0009-2509(86)87141-X

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

(Edited Abstract)

引用

页码：643 / 650

页数：8

共 16 条

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