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THE EFFECT OF FILM THICKNESS ON THE ELECTRICAL-PROPERTIES OF LPCVD POLYSILICON FILMS
被引:35
作者
:
LU, NCC
论文数:
0
引用数:
0
h-index:
0
机构:
NATL CHIAO TUNG UNIV,INST ELECTR,HSINCHU,TAIWAN
LU, NCC
LU, CY
论文数:
0
引用数:
0
h-index:
0
机构:
NATL CHIAO TUNG UNIV,INST ELECTR,HSINCHU,TAIWAN
LU, CY
LEE, MK
论文数:
0
引用数:
0
h-index:
0
机构:
NATL CHIAO TUNG UNIV,INST ELECTR,HSINCHU,TAIWAN
LEE, MK
SHIH, CC
论文数:
0
引用数:
0
h-index:
0
机构:
NATL CHIAO TUNG UNIV,INST ELECTR,HSINCHU,TAIWAN
SHIH, CC
WANG, CS
论文数:
0
引用数:
0
h-index:
0
机构:
NATL CHIAO TUNG UNIV,INST ELECTR,HSINCHU,TAIWAN
WANG, CS
REUTER, W
论文数:
0
引用数:
0
h-index:
0
机构:
NATL CHIAO TUNG UNIV,INST ELECTR,HSINCHU,TAIWAN
REUTER, W
SHENG, TT
论文数:
0
引用数:
0
h-index:
0
机构:
NATL CHIAO TUNG UNIV,INST ELECTR,HSINCHU,TAIWAN
SHENG, TT
机构
:
[1]
NATL CHIAO TUNG UNIV,INST ELECTR,HSINCHU,TAIWAN
[2]
N CAROLINA STATE UNIV,DEPT ELECT & COMP ENGN,RALEIGH,NC 27650
[3]
AT&T BELL LABS,MURRAY HILL,NJ 07974
来源
:
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
|
1984年
/ 131卷
/ 04期
关键词
:
D O I
:
10.1149/1.2115724
中图分类号
:
O646 [电化学、电解、磁化学];
学科分类号
:
081704 ;
摘要
:
引用
收藏
页码:897 / 902
页数:6
相关论文
共 25 条
[1]
TRANSPORT PROPERTIES OF POLYCRYSTALLINE SILICON FILMS
[J].
BACCARANI, G
论文数:
0
引用数:
0
h-index:
0
机构:
CNR,LAMEL LAB,I-40126 BOLOGNA,ITALY
CNR,LAMEL LAB,I-40126 BOLOGNA,ITALY
BACCARANI, G
;
RICCO, B
论文数:
0
引用数:
0
h-index:
0
机构:
CNR,LAMEL LAB,I-40126 BOLOGNA,ITALY
CNR,LAMEL LAB,I-40126 BOLOGNA,ITALY
RICCO, B
;
SPADINI, G
论文数:
0
引用数:
0
h-index:
0
机构:
CNR,LAMEL LAB,I-40126 BOLOGNA,ITALY
CNR,LAMEL LAB,I-40126 BOLOGNA,ITALY
SPADINI, G
.
JOURNAL OF APPLIED PHYSICS,
1978,
49
(11)
:5565
-5570
[2]
CORRECTION
[J].
BOARD, K
论文数:
0
引用数:
0
h-index:
0
BOARD, K
.
JOURNAL OF APPLIED PHYSICS,
1981,
52
(06)
:4351
-4351
[3]
EXACT ANALYSIS OF THE CONDUCTIVITY OF POLYCRYSTALLINE SILICON FILMS
[J].
BOARD, K
论文数:
0
引用数:
0
h-index:
0
BOARD, K
;
DARWISH, M
论文数:
0
引用数:
0
h-index:
0
DARWISH, M
.
JOURNAL OF APPLIED PHYSICS,
1980,
51
(08)
:4546
-4547
[4]
BRIDGE AND VAN-DER-PAUW SHEET RESISTORS FOR CHARACTERIZING LINE-WIDTH OF CONDUCTING LAYERS
[J].
BUEHLER, MG
论文数:
0
引用数:
0
h-index:
0
机构:
National Bureau of Standards, Electronic Technology Division, Washington
BUEHLER, MG
;
GRANT, SD
论文数:
0
引用数:
0
h-index:
0
机构:
National Bureau of Standards, Electronic Technology Division, Washington
GRANT, SD
;
THURBER, WR
论文数:
0
引用数:
0
h-index:
0
机构:
National Bureau of Standards, Electronic Technology Division, Washington
THURBER, WR
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1978,
125
(04)
:650
-654
[5]
EXPERIMENTAL-STUDY OF VARIOUS CROSS SHEET RESISTOR TEST STRUCTURES
[J].
BUEHLER, MG
论文数:
0
引用数:
0
h-index:
0
BUEHLER, MG
;
THURBER, WR
论文数:
0
引用数:
0
h-index:
0
THURBER, WR
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1978,
125
(04)
:645
-650
[6]
GRAIN-SIZE AND RESISTIVITY OF LPCVD POLYCRYSTALLINE SILICON FILMS
[J].
COLINGE, JP
论文数:
0
引用数:
0
h-index:
0
机构:
CATHOLIC UNIV LOUVAIN,CHIM MINERALE & CATALYSE GRP,B-1348 LOUVAIN LA NEUVE,BELGIUM
COLINGE, JP
;
DEMOULIN, E
论文数:
0
引用数:
0
h-index:
0
机构:
CATHOLIC UNIV LOUVAIN,CHIM MINERALE & CATALYSE GRP,B-1348 LOUVAIN LA NEUVE,BELGIUM
DEMOULIN, E
;
DELANNAY, F
论文数:
0
引用数:
0
h-index:
0
机构:
CATHOLIC UNIV LOUVAIN,CHIM MINERALE & CATALYSE GRP,B-1348 LOUVAIN LA NEUVE,BELGIUM
DELANNAY, F
;
LOBET, M
论文数:
0
引用数:
0
h-index:
0
机构:
CATHOLIC UNIV LOUVAIN,CHIM MINERALE & CATALYSE GRP,B-1348 LOUVAIN LA NEUVE,BELGIUM
LOBET, M
;
TEMERSON, JM
论文数:
0
引用数:
0
h-index:
0
机构:
CATHOLIC UNIV LOUVAIN,CHIM MINERALE & CATALYSE GRP,B-1348 LOUVAIN LA NEUVE,BELGIUM
TEMERSON, JM
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1981,
128
(09)
:2009
-2014
[7]
CHEMICAL VAPOR DEPOSITED POLYCRYSTALLINE SILICON.
[J].
Cowher, M.E.
论文数:
0
引用数:
0
h-index:
0
Cowher, M.E.
;
Sedgwick, T.O.
论文数:
0
引用数:
0
h-index:
0
Sedgwick, T.O.
.
1600,
(119)
[8]
FALCKENBERG R, 1979, ELECTROCHEMICAL SOC, P1429
[9]
DEPENDENCE OF RESISTIVITY ON DOPING LEVEL OF POLYCRYSTALLINE SILICON
[J].
FRIPP, AL
论文数:
0
引用数:
0
h-index:
0
机构:
NASA,LANGLEY RES CTR,HAMPTON,VA 23665
NASA,LANGLEY RES CTR,HAMPTON,VA 23665
FRIPP, AL
.
JOURNAL OF APPLIED PHYSICS,
1975,
46
(03)
:1240
-1244
[10]
SYSTEM FOR COMBINED SIMS-AES-XPS STUDIES OF SOLIDS
[J].
FRISCH, MA
论文数:
0
引用数:
0
h-index:
0
FRISCH, MA
;
REUTER, W
论文数:
0
引用数:
0
h-index:
0
REUTER, W
;
WITTMAACK, K
论文数:
0
引用数:
0
h-index:
0
WITTMAACK, K
.
REVIEW OF SCIENTIFIC INSTRUMENTS,
1980,
51
(06)
:695
-704
←
1
2
3
→
共 25 条
[1]
TRANSPORT PROPERTIES OF POLYCRYSTALLINE SILICON FILMS
[J].
BACCARANI, G
论文数:
0
引用数:
0
h-index:
0
机构:
CNR,LAMEL LAB,I-40126 BOLOGNA,ITALY
CNR,LAMEL LAB,I-40126 BOLOGNA,ITALY
BACCARANI, G
;
RICCO, B
论文数:
0
引用数:
0
h-index:
0
机构:
CNR,LAMEL LAB,I-40126 BOLOGNA,ITALY
CNR,LAMEL LAB,I-40126 BOLOGNA,ITALY
RICCO, B
;
SPADINI, G
论文数:
0
引用数:
0
h-index:
0
机构:
CNR,LAMEL LAB,I-40126 BOLOGNA,ITALY
CNR,LAMEL LAB,I-40126 BOLOGNA,ITALY
SPADINI, G
.
JOURNAL OF APPLIED PHYSICS,
1978,
49
(11)
:5565
-5570
[2]
CORRECTION
[J].
BOARD, K
论文数:
0
引用数:
0
h-index:
0
BOARD, K
.
JOURNAL OF APPLIED PHYSICS,
1981,
52
(06)
:4351
-4351
[3]
EXACT ANALYSIS OF THE CONDUCTIVITY OF POLYCRYSTALLINE SILICON FILMS
[J].
BOARD, K
论文数:
0
引用数:
0
h-index:
0
BOARD, K
;
DARWISH, M
论文数:
0
引用数:
0
h-index:
0
DARWISH, M
.
JOURNAL OF APPLIED PHYSICS,
1980,
51
(08)
:4546
-4547
[4]
BRIDGE AND VAN-DER-PAUW SHEET RESISTORS FOR CHARACTERIZING LINE-WIDTH OF CONDUCTING LAYERS
[J].
BUEHLER, MG
论文数:
0
引用数:
0
h-index:
0
机构:
National Bureau of Standards, Electronic Technology Division, Washington
BUEHLER, MG
;
GRANT, SD
论文数:
0
引用数:
0
h-index:
0
机构:
National Bureau of Standards, Electronic Technology Division, Washington
GRANT, SD
;
THURBER, WR
论文数:
0
引用数:
0
h-index:
0
机构:
National Bureau of Standards, Electronic Technology Division, Washington
THURBER, WR
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1978,
125
(04)
:650
-654
[5]
EXPERIMENTAL-STUDY OF VARIOUS CROSS SHEET RESISTOR TEST STRUCTURES
[J].
BUEHLER, MG
论文数:
0
引用数:
0
h-index:
0
BUEHLER, MG
;
THURBER, WR
论文数:
0
引用数:
0
h-index:
0
THURBER, WR
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1978,
125
(04)
:645
-650
[6]
GRAIN-SIZE AND RESISTIVITY OF LPCVD POLYCRYSTALLINE SILICON FILMS
[J].
COLINGE, JP
论文数:
0
引用数:
0
h-index:
0
机构:
CATHOLIC UNIV LOUVAIN,CHIM MINERALE & CATALYSE GRP,B-1348 LOUVAIN LA NEUVE,BELGIUM
COLINGE, JP
;
DEMOULIN, E
论文数:
0
引用数:
0
h-index:
0
机构:
CATHOLIC UNIV LOUVAIN,CHIM MINERALE & CATALYSE GRP,B-1348 LOUVAIN LA NEUVE,BELGIUM
DEMOULIN, E
;
DELANNAY, F
论文数:
0
引用数:
0
h-index:
0
机构:
CATHOLIC UNIV LOUVAIN,CHIM MINERALE & CATALYSE GRP,B-1348 LOUVAIN LA NEUVE,BELGIUM
DELANNAY, F
;
LOBET, M
论文数:
0
引用数:
0
h-index:
0
机构:
CATHOLIC UNIV LOUVAIN,CHIM MINERALE & CATALYSE GRP,B-1348 LOUVAIN LA NEUVE,BELGIUM
LOBET, M
;
TEMERSON, JM
论文数:
0
引用数:
0
h-index:
0
机构:
CATHOLIC UNIV LOUVAIN,CHIM MINERALE & CATALYSE GRP,B-1348 LOUVAIN LA NEUVE,BELGIUM
TEMERSON, JM
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1981,
128
(09)
:2009
-2014
[7]
CHEMICAL VAPOR DEPOSITED POLYCRYSTALLINE SILICON.
[J].
Cowher, M.E.
论文数:
0
引用数:
0
h-index:
0
Cowher, M.E.
;
Sedgwick, T.O.
论文数:
0
引用数:
0
h-index:
0
Sedgwick, T.O.
.
1600,
(119)
[8]
FALCKENBERG R, 1979, ELECTROCHEMICAL SOC, P1429
[9]
DEPENDENCE OF RESISTIVITY ON DOPING LEVEL OF POLYCRYSTALLINE SILICON
[J].
FRIPP, AL
论文数:
0
引用数:
0
h-index:
0
机构:
NASA,LANGLEY RES CTR,HAMPTON,VA 23665
NASA,LANGLEY RES CTR,HAMPTON,VA 23665
FRIPP, AL
.
JOURNAL OF APPLIED PHYSICS,
1975,
46
(03)
:1240
-1244
[10]
SYSTEM FOR COMBINED SIMS-AES-XPS STUDIES OF SOLIDS
[J].
FRISCH, MA
论文数:
0
引用数:
0
h-index:
0
FRISCH, MA
;
REUTER, W
论文数:
0
引用数:
0
h-index:
0
REUTER, W
;
WITTMAACK, K
论文数:
0
引用数:
0
h-index:
0
WITTMAACK, K
.
REVIEW OF SCIENTIFIC INSTRUMENTS,
1980,
51
(06)
:695
-704
←
1
2
3
→