TOTAL DOSE RADIATION HARDNESS OF MOS DEVICES IN HERMETIC CERAMIC PACKAGES

被引:49
作者
KOHLER, RA
KUSHNER, RA
LEE, KH
机构
关键词
D O I
10.1109/23.25486
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:1492 / 1496
页数:5
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[1]   GROWTH AND ANNEALING OF TRAPPED HOLES AND INTERFACE STATES USING TIME-DEPENDENT BIASES [J].
FREITAG, RK ;
DOZIER, CM ;
BROWN, DB .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1987, 34 (06) :1172-1177
[3]   RADIATION-INDUCED DEFECTS IN SIO2 AS DETERMINED WITH XPS [J].
GRUNTHANER, FJ ;
GRUNTHANER, PJ ;
MASERJIAN, J .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1982, 29 (06) :1462-1466
[4]   CORRELATION BETWEEN MECHANICAL-STRESS AND HYDROGEN-RELATED EFFECTS ON RADIATION-INDUCED DAMAGE IN MOS STRUCTURES [J].
KASAMA, K ;
TSUKIJI, M ;
KOBAYASHI, K .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1987, 34 (06) :1202-1207
[5]   INTERFACE TRAP GENERATION IN SILICON DIOXIDE WHEN ELECTRONS ARE CAPTURED BY TRAPPED HOLES [J].
LAI, SK .
JOURNAL OF APPLIED PHYSICS, 1983, 54 (05) :2540-2546
[6]   RADIATION HARD 10 MU-M CMOS TECHNOLOGY [J].
LEE, KH ;
DESKO, JC ;
KOHLER, RA ;
LAWRENCE, CW ;
NAGY, WJ ;
SHIMER, JA ;
STEENWYK, SD ;
ANDERSON, RE ;
FU, JS .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1987, 34 (06) :1460-1463
[9]   THE ROLE OF HYDROGEN IN RADIATION-INDUCED DEFECT FORMATION IN POLYSILICON GATE MOS DEVICES [J].
SCHWANK, JR ;
FLEETWOOD, DM ;
WINOKUR, PS ;
DRESSENDORFER, PV ;
TURPIN, DC ;
SANDERS, DT .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1987, 34 (06) :1152-1158
[10]   PHYSICAL-MECHANISMS CONTRIBUTING TO DEVICE REBOUND [J].
SCHWANK, JR ;
WINOKUR, PS ;
MCWHORTER, PJ ;
SEXTON, FW ;
DRESSENDORFER, PV ;
TURPIN, DC .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1984, 31 (06) :1434-1438