KINETICS OF CHANGES IN NF AND DIT AT THE SI-SIO2 INTERFACE UNDER LONG-TERM POSITIVE AS WELL AS NEGATIVE BIAS TEMPERATURE AGING

被引：21

作者：

SHIONO, N

NAKAJIMA, O

HASHIMOTO, C

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 01期

关键词：

D O I：

10.1149/1.2119641

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

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页码：138 / 143

页数：6

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