PHOTOCONDUCTIVITY IN DOPED MICROCRYSTALLINE SI-H,CL FILMS

被引：2

作者：

AUGELLI, V ^{[1
]}

LIGONZO, T ^{[1
]}

MURRI, R ^{[1
]}

SCHIAVULLI, L ^{[1
]}

机构：

[1] UNIV BARI,GRP NAZL STRUTTURA MAT,UNITA CENT INTERUNIV STRUTTURA MAT,I-70126 BARI,ITALY

来源：

JOURNAL OF APPLIED PHYSICS | 1986年 / 59卷 / 08期

关键词：

D O I：

10.1063/1.336943

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2863 / 2865

页数：3

共 12 条

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