THE EFFECT OF SURFACE ORIENTATION ON SILICON OXIDATION-KINETICS

被引：52

作者：

LEWIS, EA

IRENE, EA

机构：

[1] Univ of North Carolina, Chapel Hill,, NC, USA, Univ of North Carolina, Chapel Hill, NC, USA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 09期

关键词：

All Open Access; Green;

D O I：

10.1149/1.2100881

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

SEMICONDUCTING SILICON

引用

页码：2332 / 2339

页数：8

共 41 条

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[9]

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