OXIDATION-RATE DEPENDENCE OF PHOSPHORUS DIFFUSIVITY IN SILICON

被引：34

作者：

MASETTI, G ^{[1
]}

SOLMI, S ^{[1
]}

SONCINI, G ^{[1
]}

机构：

[1] CNR,LAMEL LAB,I-40126 BOLOGNA,ITALY

来源：

PHILOSOPHICAL MAGAZINE | 1976年 / 33卷 / 04期

关键词：

D O I：

10.1080/14786437608221123

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：613 / 621

页数：9

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