INFLUENCE OF SURFACE FLUORINATION ON THE OXIDATION OF AMORPHOUS-SILICON BY ATOMIC OXYGEN AT 300-K

被引：1

作者：

CLAASSEN, WCM

SCHMITZ, RWAH

DIELEMAN, J

机构：

来源：

APPLIED SURFACE SCIENCE | 1989年 / 43卷

关键词：

D O I：

10.1016/0169-4332(89)90227-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：292 / 296

页数：5

共 16 条

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[4]

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