EFFECTS OF FLUORINE IMPLANTATION ON THE KINETICS OF DRY OXIDATION OF SILICON

被引：9

作者：

KUPER, FG

DEHOSSON, JTM

VERWEY, JF

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1986年 / 60卷 / 03期

关键词：

D O I：

10.1063/1.337342

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：985 / 990

页数：6

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