HIGH-RATE HOLLOW-CATHODE AMORPHOUS-SILICON DEPOSITION

被引:8
作者
HORWITZ, CM [1 ]
MCKENZIE, DR [1 ]
机构
[1] UNIV SYDNEY, DEPT APPL PHYS, SYDNEY, NSW 2006, AUSTRALIA
来源
APPLICATIONS OF SURFACE SCIENCE | 1985年 / 22-3卷 / MAY期
关键词
D O I
10.1016/0378-5963(85)90225-9
中图分类号
学科分类号
摘要
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页码:925 / 929
页数:5
相关论文
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