CO2-LASER OXIDATION OF SILICON

被引：3

作者：

BOYD, IW

WILSON, JIB

机构：

来源：

PHYSICA B & C | 1983年 / 117卷 / MAR期

关键词：

D O I：

10.1016/0378-4363(83)90728-3

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：1030 / 1032

页数：3

共 8 条

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WILSON, JIB ;

WEST, JL .

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CROWDER, JG .

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[5]

GASKELL PH, 1971, DISCUSS FARADAY SOC, V50, P82

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GIBBONS, JF .

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[7] LASER OXIDATION OF GAAS [J].

MATSUURA, M ;

ISHIDA, M ;

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JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (10) :L726-L728

[8] STRUCTURAL EVALUATION OF SILICON OXIDE FILMS [J].

PLISKIN, WA ;

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