LOW DARK CURRENT QUASI-SCHOTTKY BARRIER MSM-PHOTODIODE STRUCTURES ON N-GA0.47IN0.53AS WITH P+-GA0.47IN0.53AS CAP LAYER

被引:8
作者
AVERIN, SV
KOHL, A
MULLER, R
KUSTERS, AM
WISSER, J
HEIME, K
机构
[1] Institut für Halbleitertechnik RWTH Aachen, Templergra-ben JJ
关键词
PHOTODIODES; DIODES; SEMICONDUCTOR DEVICES AND MATERIALS;
D O I
10.1049/el:19920631
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The p+-cap layer was used to fabricate a metal-semiconductor-metal (MSM) interdigitated photodetector on Ga0.47In0.53As. The measured barrier height was PHI(Bn) = 0.52 V, the ideality factor n = 1.1 and average dark current density 2 mA/cm2. A rise time of 45 ps at lambda = 1.3-mu-m under 2 V bias was measured for an MSM photodiode with 3-mu-m finger width and finger gaps and an active area of 100 x 100-mu-m2.
引用
收藏
页码:992 / 995
页数:4
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