DEEP IMPURITY LEVELS OF COBALT IN SILICON

被引:10
作者
NAKASHIMA, H
TSUMORI, Y
MIYAGAWA, T
HASHIMOTO, K
机构
[1] Department of Electrical Engineering, Kyushu University, Higashi-ku, Fukuoka, 812, Hakozaki
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1990年 / 29卷 / 08期
关键词
Cobalt; Deep level; Deep trap; DL TS; Silicon; Tungsten;
D O I
10.1143/JJAP.29.1395
中图分类号
O59 [应用物理学];
学科分类号
摘要
It has been believed until now that cobalt in silicon forms an acceptor level at around Ec–0.53 eV and a donor level at around Ev+0.35 eV. However, it is found that an acceptor level at Ec–(0.40±0.02)eV and a donor level at Ev+(0.23±0.01) eV are attributed to the amphoteric cobalt levels from the DLTS measurements for the samples diffused with cobalt deposited from the evaporation of a pure cobalt wire. The former levels (0.53 eV and 0.35 eV) are observed only for the samples prepared by the cobalt deposition from a tungsten filament wrapped with cobalt wire, and the tungsten contamination is regarded to be the cause of these levels. © 1990 The Japan Society of Applied Physics.
引用
收藏
页码:1395 / 1398
页数:4
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