DEPOSITION OF HIGH-QUALITY GAAS FILMS AT FAST RATES IN THE LP-CVD SYSTEM

被引：49

作者：

GRUTER, K

DESCHLER, M

JURGENSEN, H

BECCARD, R

BALK, P

机构：

来源：

JOURNAL OF CRYSTAL GROWTH | 1989年 / 94卷 / 03期

关键词：

D O I：

10.1016/0022-0248(89)90082-1

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

页码：607 / 612

页数：6

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