COMPARATIVE-STUDY OF NB AND TIW BARRIER LAYERS BETWEEN AU AND A-SIO2

被引：12

作者：

LIEHR, M

DELRUE, JP

CAUDANO, R

HERBOTS, N

VANDENBERGHE, RAL

VLAEMINCK, R

LOOS, H

机构：

[1] CATHOLIC UNIV LOUVAIN,FAI,MICROELECTR LAB,B-1348 LOUVAIN LA NEUVE,BELGIUM

[2] BELL TEL MFG CO,B-9000 GENT,BELGIUM

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1984年 / 2卷 / 02期

关键词：

D O I：

10.1116/1.572583

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：288 / 291

页数：4

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