EPITAXIAL NISI2 FORMATION BY PULSED LASER IRRADIATION OF THIN NI LAYERS DEPOSITED ON SI SUBSTRATES

被引：20

作者：

GRIMALDI, MG ^{[1
]}

BAERI, P ^{[1
]}

RIMINI, E ^{[1
]}

CELOTTI, G ^{[1
]}

机构：

[1] LAMEL CNR,BOLOGNA,ITALY

来源：

关键词：

D O I：

10.1063/1.94313

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：244 / 246

页数：3

共 11 条

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DRIGO, AV
[J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (03) : 1525 - 1531
[3] EPITAXIAL NISI2 FORMATION BY PULSED ION-BEAM ANNEALING
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[J]. APPLIED PHYSICS LETTERS, 1982, 40 (07) : 595 - 597
[4] INTERFACIAL ORDER IN EPITAXIAL NISI2
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[5] INTERFACE AND SURFACE-STRUCTURE OF EPITAXIAL NISI2 FILMS
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[J]. APPLIED PHYSICS LETTERS, 1981, 38 (12) : 988 - 990
[6] ELECTRON-BEAM INDUCED REACTIONS IN METAL SI SYSTEMS
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NAVA, F
OTTAVIANI, G
LUCHES, A
NASSISI, V
CELOTTI, G
[J]. VACUUM, 1982, 32 (01) : 11 - 18
[7] Mayer J. W., 1982, LASER ANNEALING SEMI
[8] LASER-INDUCED REACTIONS OF PLATINUM AND OTHER METAL-FILMS WITH SILICON
POATE, JM
LEAMY, HJ
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CELLER, GK
[J]. APPLIED PHYSICS LETTERS, 1978, 33 (11) : 918 - 920
[9] SILICIDE FORMATION USING A SCANNING CW LASER-BEAM
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SIGMON, TW
[J]. APPLIED PHYSICS LETTERS, 1980, 36 (07) : 566 - 569
[10] Sigmon T. W., 1981, Laser and Electron-Beam Solid Interactions and Materials Processing. Proceedings of the Materials Research Society Symposium, P511