UNIVERSAL ENERGY-DEPENDENCE OF PHYSICAL AND ION-ENHANCED CHEMICAL ETCH YIELDS AT LOW ION ENERGY

被引:255
作者
STEINBRUCHEL, C [1 ]
机构
[1] RENSSELAER POLYTECH INST,DEPT MAT ENGN,TROY,NY 12180
关键词
D O I
10.1063/1.102336
中图分类号
O59 [应用物理学];
学科分类号
摘要
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页码:1960 / 1962
页数:3
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