UNIVERSAL ENERGY-DEPENDENCE OF PHYSICAL AND ION-ENHANCED CHEMICAL ETCH YIELDS AT LOW ION ENERGY

被引：255

作者：

STEINBRUCHEL, C ^{[1
]}

机构：

[1] RENSSELAER POLYTECH INST,DEPT MAT ENGN,TROY,NY 12180

来源：

APPLIED PHYSICS LETTERS | 1989年 / 55卷 / 19期

关键词：

D O I：

10.1063/1.102336

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1960 / 1962

页数：3

共 28 条

[21]

STEINBRUCHEL C, UNPUB

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