INVESTIGATION OF PLASMA-ETCHING MECHANISMS USING BEAMS OF REACTIVE GAS IONS

被引：157

作者：

MAYER, TM

BARKER, RA

WHITMAN, LJ

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 18卷 / 02期

关键词：

D O I：

10.1116/1.570780

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：349 / 352

页数：4

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