PLASMA ENHANCED METAL-ORGANIC CHEMICAL VAPOR-DEPOSITION OF ALUMINUM-OXIDE DIELECTRIC FILM FOR DEVICE APPLICATIONS

被引：52

作者：

PANDE, KP

NAIR, VKR

GUTIERREZ, D

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1983年 / 54卷 / 09期

关键词：

D O I：

10.1063/1.332725

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：5436 / 5440

页数：5

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