DETERMINATION OF FILM STRESSES DURING SPUTTER DEPOSITION USING AN INSITU PROBE

被引：15

作者：

HOFFMAN, DW

KUKLA, CM

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 06期

关键词：

D O I：

10.1116/1.572842

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2600 / 2604

页数：5

共 28 条

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[13]

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[14]

HOFFMAN DW, 1982, 7TH P ICVM TOK, P145

[15]

Hoffman R. W., 1966, PHYS THIN FILMS, VVol. 3, pp. 211

[16]

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[18] INTERNAL-STRESS AND YOUNGS MODULUS OF TIC COATINGS [J].

KINBARA, A ;

BABA, S .

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[19] MECHANICAL-PROPERTIES OF AND CRACKS AND WRINKLES IN VACUUM-DEPOSITED MGF2, CARBON AND BORON COATINGS [J].

KINBARA, A ;

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TAKAMISAWA, K .

THIN SOLID FILMS, 1981, 84 (02) :205-212

[20] INTRINSIC STRESS IN EVAPORATED METAL FILMS [J].

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