PHOTO-LITHOGRAPHIC PROCESSES IN AMORPHOUS-SEMICONDUCTORS

被引：12

作者：

JANAI, M

机构：

来源：

JOURNAL DE PHYSIQUE | 1981年 / 42卷 / NC4期

关键词：

D O I：

10.1051/jphyscol:19814241

中图分类号：

学科分类号：

摘要：

引用

页码：1105 / 1114

页数：10

共 54 条

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[43]

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[45]

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[50] NEW INORGANIC ELECTRON RESIST OF HIGH CONTRAST [J].

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