STRESS MODIFICATION OF NI-FE FILMS BY ION-BOMBARDMENT CONCURRENT WITH FILM GROWTH BY ALLOY EVAPORATION

被引:15
作者
WOJCIECHOWSKI, PH
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期
关键词
D O I
10.1116/1.575250
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
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页码:1924 / 1928
页数:5
相关论文
共 16 条
[1]   PHYSICS OF ION PLATING AND ION-BEAM DEPOSITION [J].
AISENBERG, S ;
CHABOT, RW .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (01) :104-107
[2]   MODIFICATION OF NIOBIUM FILM STRESS BY LOW-ENERGY ION-BOMBARDMENT DURING DEPOSITION [J].
CUOMO, JJ ;
HARPER, JME ;
GUARNIERI, CR ;
YEE, DS ;
ATTANASIO, LJ ;
ANGILELLO, J ;
WU, CT ;
HAMMOND, RH .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03) :349-354
[3]  
DUDONIS J, 1979, THIN SOLID FILMS, V58, P106, DOI 10.1016/0040-6090(79)90218-9
[4]   ION-ENHANCED FILM BONDING [J].
FRANKS, J ;
STUART, PR ;
WITHERS, RB .
THIN SOLID FILMS, 1979, 58 (01) :128-128
[5]  
Harper J.M.E., 1984, ION BOMBARDMENT MODI
[6]   ION-IMPLANTATION DURING FILM GROWTH AND ITS EFFECT ON SUPERCONDUCTING PROPERTIES OF NIOBIUM [J].
HEIM, G ;
KAY, E .
JOURNAL OF APPLIED PHYSICS, 1975, 46 (09) :4006-4012
[7]   THIN-FILM ANNEALING BY ION-BOMBARDMENT [J].
HIRSCH, EH ;
VARGA, IK .
THIN SOLID FILMS, 1980, 69 (01) :99-105
[8]   MODIFICATION OF EVAPORATED CHROMIUM BY CONCURRENT ION-BOMBARDMENT [J].
HOFFMAN, DW ;
GAERTTNER, MR .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (01) :425-428
[9]   EFFECT OF ION-BOMBARDMENT DURING DEPOSITION ON THE X-RAY MICROSTRUCTURE OF THIN SILVER FILMS [J].
HUANG, TC ;
LIM, G ;
PARMIGIANI, F ;
KAY, E .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (06) :2161-2166
[10]   NON-BULK-LIKE PHYSICAL-PROPERTIES OF THIN-FILMS DUE TO ION-BOMBARDMENT DURING FILM GROWTH [J].
KAY, E .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03) :462-463