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COMPARISON OF DATA TRANSFER RATES OF FOCUSED ELECTRON AND ION-BEAM NANOMETER LITHOGRAPHY

被引：4
作者：
SIEGEL, BM
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 01期
关键词：
D O I：
10.1116/1.583996
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：350 / 352
页数：3
相关论文
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