INTERACTION OF GOLD, PALLADIUM AND AU-PD ALLOY DEPOSITS WITH OXIDIZED SI(100) SUBSTRATES

被引：13

作者：

ANTON, R

机构：

来源：

THIN SOLID FILMS | 1984年 / 120卷 / 04期

关键词：

D O I：

10.1016/0040-6090(84)90244-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：293 / 311

页数：19

共 30 条

[21] FORMATION KINETICS OF CRSI2 FILMS ON SI SUBSTRATES WITH AND WITHOUT INTERPOSED PD2SI LAYER [J].

OLOWOLAFE, JO ;

NICOLET, MA ;

MAYER, JW .

JOURNAL OF APPLIED PHYSICS, 1976, 47 (12) :5182-5186

[22] STRUCTURAL-PROPERTIES OF THE PD-SI INTERFACE - AN INVESTIGATION BY REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION [J].

OUSTRY, A ;

BERTY, J ;

CAUMONT, M ;

DAVID, MJ ;

ESCAUT, A .

THIN SOLID FILMS, 1982, 97 (04) :295-300

[23]

Poate J M, 1978, THIN FILMS INTERDIFF

[24] REACTION OF THIN METAL-FILMS WITH SIO2 SUBSTRATES [J].

PRETORIUS, R ;

HARRIS, JM ;

NICOLET, MA .

SOLID-STATE ELECTRONICS, 1978, 21 (04) :667-&

[25] STUDIES OF THE GROWTH AND OXIDATION OF METAL-SILICIDES USING RADIOACTIVE SI-31 AS TRACER [J].

PRETORIUS, R .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (01) :107-112

[26] MARKER STUDIES OF SILICIDE FORMATION, SILICON SELF-DIFFUSION AND SILICON EPITAXY USING RADIOACTIVE SILICON AND RUTHERFORD BACKSCATTERING [J].

PRETORIUS, R ;

RAMILLER, CL ;

NICOLET, MA .

NUCLEAR INSTRUMENTS & METHODS, 1978, 149 (1-3) :629-633

[27] DYNAMICS OF METAL-SIOX AND SIOX-SI INTERFACES AND THE ASSOCIATED INSTABILITIES IN PRACTICAL METAL-INSULATOR SEMICONDUCTOR STRUCTURES [J].

RAJESWARAN, G ;

ANDERSON, WA ;

JACKSON, M ;

THAYER, M .

THIN SOLID FILMS, 1983, 104 (3-4) :351-359

[28]

SALVAN F, 1980, J PHYS LETT PARIS, V41, P337

[29] THE EFFECTS OF INTERFACIAL SIO2 ON PD2SI FORMATION [J].

SCOTT, DM ;

LAU, SS ;

PFEFFER, RL ;

LUX, RA ;

MIKKELSON, J ;

WIELUNSKI, L ;

NICOLET, MA .

THIN SOLID FILMS, 1983, 104 (1-2) :227-233

[30]

Tu K.N., 1974, J APPL PHYS S, V2, P669

← 1 2 3 →