EPITAXIAL SILICIDE FORMATION BY MULTI-SHOT IRRADIATION OF NI THIN-FILMS ON SI WITH ND LASER

被引:11
作者
HARITH, MA
ZHANG, JP
BAERI, P
RIMINI, E
CELOTTI, G
机构
[1] UNIV CATANIA,IST DIPARTIMENTALE FIS,I-95129 CATANIA,ITALY
[2] CNR,LAMEL,I-40100 BOLOGNA,ITALY
关键词
D O I
10.1063/1.335360
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:4560 / 4565
页数:6
相关论文
共 15 条
  • [1] BAERI P, 1983, J PHYS PARIS C, V5, P449
  • [2] TITANIUM AND NICKEL SILICIDE FORMATION AFTER Q-SWITCHED LASER AND MULTI-SCANNING ELECTRON-BEAM IRRADIATION
    BENTINI, GG
    SERVIDORI, M
    COHEN, C
    NIPOTI, R
    DRIGO, AV
    [J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (03) : 1525 - 1531
  • [3] EPITAXIAL NISI2 FORMATION BY PULSED ION-BEAM ANNEALING
    CHEN, LJ
    HUNG, LS
    MAYER, JW
    BAGLIN, JEE
    NERI, JM
    HAMMER, DA
    [J]. APPLIED PHYSICS LETTERS, 1982, 40 (07) : 595 - 597
  • [4] FOLL F, 1981, J APPL PHYS, V52, P250, DOI 10.1063/1.328440
  • [5] EPITAXIAL NISI2 FORMATION BY PULSED LASER IRRADIATION OF THIN NI LAYERS DEPOSITED ON SI SUBSTRATES
    GRIMALDI, MG
    BAERI, P
    RIMINI, E
    CELOTTI, G
    [J]. APPLIED PHYSICS LETTERS, 1983, 43 (03) : 244 - 246
  • [6] THERMAL AND ION-INDUCED DISSOCIATION OF NISI AND NISI2 IN CONTACT WITH NICKEL
    HUNG, LS
    MAYER, JW
    [J]. THIN SOLID FILMS, 1983, 109 (01) : 85 - 92
  • [7] ELECTRON-BEAM INDUCED REACTIONS IN METAL SI SYSTEMS
    MAJNI, G
    NAVA, F
    OTTAVIANI, G
    LUCHES, A
    NASSISI, V
    CELOTTI, G
    [J]. VACUUM, 1982, 32 (01) : 11 - 18
  • [8] MAYER JW, 1983, SURFACE MODIFICATION, pCH9
  • [9] NISI FORMATION AT THE SILICIDE/SI INTERFACE ON THE NIPT/SI SYSTEM
    OTTAVIANI, G
    TU, KN
    CHU, WK
    HUNG, LS
    MAYER, JW
    [J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (07) : 4903 - 4906
  • [10] LASER-INDUCED REACTIONS OF PLATINUM AND OTHER METAL-FILMS WITH SILICON
    POATE, JM
    LEAMY, HJ
    SHENG, TT
    CELLER, GK
    [J]. APPLIED PHYSICS LETTERS, 1978, 33 (11) : 918 - 920