A CONSIDERATION OF THE EFFECT OF REACTOR PARAMETERS ON THE CHARACTERISTICS OF LAYERS PREPARED BY LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION

被引：10

作者：

HITCHMAN, ML ^{[1
]}

机构：

[1] UNIV SALFORD,THIN FILM & SURFACE RES CTR,SALFORD M5 4WT,LANCS,ENGLAND

来源：

VACUUM | 1984年 / 34卷 / 3-4期

关键词：

D O I：

10.1016/0042-207X(84)90070-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：377 / 384

页数：8

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