CHANNELED SUBSTRATE BURIED HETEROSTRUCTURE INGAASP/INP LASER EMPLOYING A BURIED FE ION IMPLANT FOR CURRENT CONFINEMENT

被引：24

作者：

WILT, DP

SCHWARTZ, B

TELL, B

BEEBE, ED

NELSON, RJ

机构：

来源：

APPLIED PHYSICS LETTERS | 1984年 / 44卷 / 03期

关键词：

D O I：

10.1063/1.94728

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：290 / 292

页数：3

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