QUANTITATIVE-ANALYSIS OF W(N), TIW AND TIW(N) MATRICES USING XPS, AES, RBS, EPMA AND XRD

The structural and quantitative chemical analysis of tungsten nitrides and titanium-tungsten nitrides with variable N content (denoted as W(N) and TiW(N)) are explored by a combination of different analysis techniques. Special attention is given to the unravelling by XPS of the different binding states that are present in the surface contamination layer and in the bulk of the layers. The determination of our own sensitivity factors is essential for accurate quantification of both XPS and AES data. Comparison of the different techniques shows the presence of strong preferential sputtering for W(N) alloys, whereas this effect is unimportant for TiW(N). The influence of the vacuum of the analysis chamber of XPS and AES on the results is studied thoroughly.