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THE CONTRAST OF ION-BEAM STENCIL MASKS

被引：11
作者：
RANDALL, JN
STERN, LA
DONNELLY, JP
机构：
[1] MIT, Lexington, MA, USA, MIT, Lexington, MA, USA
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1986年 / 4卷 / 01期
关键词：
D O I：
10.1116/1.583438
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
LITHOGRAPHY
引用
收藏
页码：201 / 204
页数：4
相关论文
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