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THE CHARACTERIZATION OF INDIUM DESORBED SI SURFACES FOR LOW-TEMPERATURE SURFACE CLEANING IN SI MOLECULAR-BEAM EPITAXY
被引:17
作者
:
YANG, HT
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,DIV GEN TECHNOL,ESSEX JUNCTION,VT 05452
YANG, HT
MOONEY, PM
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,DIV GEN TECHNOL,ESSEX JUNCTION,VT 05452
MOONEY, PM
机构
:
[1]
IBM CORP,DIV GEN TECHNOL,ESSEX JUNCTION,VT 05452
[2]
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源
:
JOURNAL OF APPLIED PHYSICS
|
1985年
/ 58卷
/ 05期
关键词
:
D O I
:
10.1063/1.336014
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:1854 / 1859
页数:6
相关论文
共 10 条
[1]
DEPENDENCE OF RESIDUAL DAMAGE ON TEMPERATURE DURING AR+ SPUTTER CLEANING OF SILICON
BEAN, JC
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BEAN, JC
BECKER, GE
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BECKER, GE
PETROFF, PM
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
PETROFF, PM
SEIDEL, TE
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
SEIDEL, TE
[J].
JOURNAL OF APPLIED PHYSICS,
1977,
48
(03)
: 907
-
913
[2]
DARKEN LS, 1953, PHYSICAL CHEM METALS
[3]
ISHAZAKA A, 1982, 2ND INT S MOL BEAM E
[4]
DEEP LEVEL TRANSIENT SPECTROSCOPY STUDIES OF TRAPPING PARAMETERS FOR CENTERS IN INDIUM-DOPED SILICON
JONES, CE
论文数:
0
引用数:
0
h-index:
0
机构:
HONEYWELL INC,CTR CORP TECHNOL,BLOOMINGTON,MN 55420
HONEYWELL INC,CTR CORP TECHNOL,BLOOMINGTON,MN 55420
JONES, CE
JOHNSON, GE
论文数:
0
引用数:
0
h-index:
0
机构:
HONEYWELL INC,CTR CORP TECHNOL,BLOOMINGTON,MN 55420
HONEYWELL INC,CTR CORP TECHNOL,BLOOMINGTON,MN 55420
JOHNSON, GE
[J].
JOURNAL OF APPLIED PHYSICS,
1981,
52
(08)
: 5159
-
5163
[5]
SILICON MOLECULAR-BEAM EPITAXY WITH SIMULTANEOUS ION IMPLANT DOPING
OTA, Y
论文数:
0
引用数:
0
h-index:
0
OTA, Y
[J].
JOURNAL OF APPLIED PHYSICS,
1980,
51
(02)
: 1102
-
1110
[6]
SHARMA BL, 1970, DIFFUSION SEMICONDUC, P86
[7]
CRYSTAL DEFECTS OF SILICON FILMS FORMED BY MOLECULAR-BEAM EPITAXY
SUGIURA, H
论文数:
0
引用数:
0
h-index:
0
SUGIURA, H
YAMAGUCHI, M
论文数:
0
引用数:
0
h-index:
0
YAMAGUCHI, M
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS,
1980,
19
(04)
: 583
-
589
[8]
Sze S., 1981, PHYS SEMICONDUCTOR D, P68
[9]
REDUCTION OF OXIDES ON SILICON BY HEATING IN A GALLIUM MOLECULAR-BEAM AT 800-DEGREES-C
WRIGHT, S
论文数:
0
引用数:
0
h-index:
0
WRIGHT, S
KROEMER, H
论文数:
0
引用数:
0
h-index:
0
KROEMER, H
[J].
APPLIED PHYSICS LETTERS,
1980,
36
(03)
: 210
-
211
[10]
PREPARATION OF ATOMICALLY CLEAN SILICON SURFACES BY PULSED LASER IRRADIATION
ZEHNER, DM
论文数:
0
引用数:
0
h-index:
0
ZEHNER, DM
WHITE, CW
论文数:
0
引用数:
0
h-index:
0
WHITE, CW
OWNBY, GW
论文数:
0
引用数:
0
h-index:
0
OWNBY, GW
[J].
APPLIED PHYSICS LETTERS,
1980,
36
(01)
: 56
-
59
←
1
→
共 10 条
[1]
DEPENDENCE OF RESIDUAL DAMAGE ON TEMPERATURE DURING AR+ SPUTTER CLEANING OF SILICON
BEAN, JC
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BEAN, JC
BECKER, GE
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BECKER, GE
PETROFF, PM
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
PETROFF, PM
SEIDEL, TE
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
SEIDEL, TE
[J].
JOURNAL OF APPLIED PHYSICS,
1977,
48
(03)
: 907
-
913
[2]
DARKEN LS, 1953, PHYSICAL CHEM METALS
[3]
ISHAZAKA A, 1982, 2ND INT S MOL BEAM E
[4]
DEEP LEVEL TRANSIENT SPECTROSCOPY STUDIES OF TRAPPING PARAMETERS FOR CENTERS IN INDIUM-DOPED SILICON
JONES, CE
论文数:
0
引用数:
0
h-index:
0
机构:
HONEYWELL INC,CTR CORP TECHNOL,BLOOMINGTON,MN 55420
HONEYWELL INC,CTR CORP TECHNOL,BLOOMINGTON,MN 55420
JONES, CE
JOHNSON, GE
论文数:
0
引用数:
0
h-index:
0
机构:
HONEYWELL INC,CTR CORP TECHNOL,BLOOMINGTON,MN 55420
HONEYWELL INC,CTR CORP TECHNOL,BLOOMINGTON,MN 55420
JOHNSON, GE
[J].
JOURNAL OF APPLIED PHYSICS,
1981,
52
(08)
: 5159
-
5163
[5]
SILICON MOLECULAR-BEAM EPITAXY WITH SIMULTANEOUS ION IMPLANT DOPING
OTA, Y
论文数:
0
引用数:
0
h-index:
0
OTA, Y
[J].
JOURNAL OF APPLIED PHYSICS,
1980,
51
(02)
: 1102
-
1110
[6]
SHARMA BL, 1970, DIFFUSION SEMICONDUC, P86
[7]
CRYSTAL DEFECTS OF SILICON FILMS FORMED BY MOLECULAR-BEAM EPITAXY
SUGIURA, H
论文数:
0
引用数:
0
h-index:
0
SUGIURA, H
YAMAGUCHI, M
论文数:
0
引用数:
0
h-index:
0
YAMAGUCHI, M
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS,
1980,
19
(04)
: 583
-
589
[8]
Sze S., 1981, PHYS SEMICONDUCTOR D, P68
[9]
REDUCTION OF OXIDES ON SILICON BY HEATING IN A GALLIUM MOLECULAR-BEAM AT 800-DEGREES-C
WRIGHT, S
论文数:
0
引用数:
0
h-index:
0
WRIGHT, S
KROEMER, H
论文数:
0
引用数:
0
h-index:
0
KROEMER, H
[J].
APPLIED PHYSICS LETTERS,
1980,
36
(03)
: 210
-
211
[10]
PREPARATION OF ATOMICALLY CLEAN SILICON SURFACES BY PULSED LASER IRRADIATION
ZEHNER, DM
论文数:
0
引用数:
0
h-index:
0
ZEHNER, DM
WHITE, CW
论文数:
0
引用数:
0
h-index:
0
WHITE, CW
OWNBY, GW
论文数:
0
引用数:
0
h-index:
0
OWNBY, GW
[J].
APPLIED PHYSICS LETTERS,
1980,
36
(01)
: 56
-
59
←
1
→