RAPID LOW-RESISTANCE INTERCONNECTS BY SELECTIVE TUNGSTEN DEPOSITION ON LASER-DIRECT-WRITTEN POLYSILICON

被引：9

作者：

BLACK, JG

EHRLICH, DJ

SEDLACEK, JHC

FEINERMAN, AD

BUSTA, HH

机构：

[1] NORTHWESTERN UNIV,DEPT PHYS & ASTRON,EVANSTON,IL 60621

[2] AMOCO RES CTR,NAPERVILLE,IL 60540

来源：

IEEE ELECTRON DEVICE LETTERS | 1986年 / 7卷 / 07期

关键词：

D O I：

10.1109/EDL.1986.26423

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：422 / 424

页数：3

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