A STUDY OF ALUMINUM-OXIDE THIN-FILMS PREPARED BY ATMOSPHERIC-PRESSURE CHEMICAL VAPOR-DEPOSITION FROM TRIMETHYLALUMINUM + OXYGEN AND OR NITROUS-OXIDE

被引：14

作者：

GUSTIN, KM

GORDON, RG

机构：

来源：

JOURNAL OF ELECTRONIC MATERIALS | 1988年 / 17卷 / 06期

关键词：

D O I：

10.1007/BF02652101

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：509 / 517

页数：9

共 34 条

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